Hafnium
Hafnium is used in iron, titanium, niobium, tantalum, and other metal alloys.
Small additions of hafnium increase the adherence of protective oxide scales on nickel based alloys. It improves thereby the corrosion resistance especially under cyclic temperature conditions that tend to break oxide scales by inducing thermal stresses between the bulk material and the oxide layer.
The electronics industry discovered that hafnium-based compound can be employed in gate insulators in the 45 nm generation of integrated circuits from Intel, IBM and others.Hafnium oxide-based compounds are practical high-k dielectrics, allowing reduction of the gate leakage current which improves performance at such scales.
Due to its heat resistance and its affinity to oxygen and nitrogen, hafnium is a good scavenger for oxygen and nitrogen in gas-filled and incandescent lamps. Hafnium is also used as the electrode in plasma cutting because of its ability to shield electrons into air.
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